Characterization of semiconductor structures in the VUV wavelength range using spectroscopic ellipsometry and spectroscopic photometry

摘要

A new generation of spectroscopic ellipsometer capable to work down to 145nm is presented. Included in a purged glove box to reduce the oxygen and water contamination in the part per million ranges, the system can make spectroscopic ellipsometry and spectroscopic photometry in the wavelength range 145-700nm. Including a premonochromator in the polarizer arm to avoid photo bleaching, the optical setup works in rotating analyzer configuration to minimize the parasitic polarization. Experimental results on different kinds of materials for the microelectronics are presented.