首页> 外文期刊>Journal of Applied Physics >Heating of liquid substrate by low-pressure sputtering plasma
【24h】

Heating of liquid substrate by low-pressure sputtering plasma

机译:低压溅射等离子体加热液体基板

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

The heating of the liquid substrate by low-pressure (similar to 1 Pa) sputtering plasma has been investigated by in situ temperature measurements. The combination of "green" non-toxic solvent, castor oil, copper target, and direct current magnetron sputtering was chosen as a model system. The temperature increase induced by plasma was registered with two thermocouples placed immediately under the liquid surface and in the bulk solution. The effect of the working gas pressure and sputter power was studied. It was shown that the liquid temperature increases at a rate of up to 1 degrees C/ min, depending on the sputtering conditions. The experimental data were compared with numerical calculations and COMSOL simulation. Provided information is essential data for the detailed explanation of the formation of nanoparticles during sputtering onto liquids, a clean approach for production of colloidal solutions of "naked" nanoparticles. Published under an exclusive license by AIP Publishing.
机译:通过原位温度测量研究了通过低压(类似于 1 Pa)溅射等离子体加热液体基板的过程。选择“绿色”无毒溶剂、蓖麻油、铜靶材和直流磁控溅射的组合作为模型系统。等离子体引起的温度升高被两个热电偶记录下来,这两个热电偶直接放置在液体表面下方和散装溶液中。研究了工作气体压力和溅射功率的影响。结果表明,液体温度以高达 1 摄氏度/分钟的速度升高,具体取决于溅射条件。将实验数据与数值计算和 COMSOL 仿真进行比较。所提供的信息是详细解释溅射到液体上时纳米颗粒形成的基本数据,这是一种生产“裸”纳米颗粒胶体溶液的清洁方法。由 AIP Publishing 独家许可发布。

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号