Research Disclosure

摘要

This research disclosure relates to improvements to a lithographic system. The lithographic system may, for example, be an extreme ultraviolet (EUV) lithographic system that comprises an EUV radiation source and a lithographic apparatus. Photo-lithography is a process of transferring a pattern to a radiation-sensitive substrate by exposing the substrale to radiation having the pattern. Radiation used in a lithographic apparatus may be EUV radiation. EUV lithographic systems may use radiation with a wavelength of approximately 13.5 nm. EUV radiation may be produced by a laser-produced plasma (UPP) radiation source.