Low-temperature deposition of yttrium oxide on flexible PET films using time-separated yttrium precursor and oxidizer injections

摘要

Low-temperature deposition of Y_2O_3 at 80℃ is studied usingan yttrium precursor of tris(butylcyclopentadienyl)yttrium (Y(BuCp)_3) andplasma exited humidified argon oxidizer. The deposition is demonstratedusing an atomic-layer-deposition sequence; the Y(BuCp)_3 and the oxidizinggases are time separately introduced to the reaction chamber and theseinjections are repeated. To determine the gas introduction conditions,surface reactions of Y(BuCp_3 adsorption and its oxidization are observedby an in-situ IR absorption spectroscopy. The deposited film is confirmedas fully oxidized Y_2O_3 by X-ray photoelectron spectroscopy. The presentdeposition is applicable for the deposition of Y_2O_3 film on flexiblepolyethylene terephthalate films.