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Method for alignment layout

机译:Method for alignment layout

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A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually unto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of structures for integrated circuits (ICs). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability are under a fast-paced and extensive development One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as EUV or EUVL). which allows for sub-10 nanometre (nm) scale resolution.

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    《Research Disclosure》 |2023年第710期|701-702|共2页
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