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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Development of Sputter Epitaxy Technique of Pure-Perovskite (001)/(100)-Oriented Sm-Doped Pb(Mgamp;subamp;1/3amp;/subamp;, Nbamp;subamp;2/3amp;/subamp;)Oamp;subamp;3amp;/subamp;–PbTiOamp;subamp;3amp;/subamp; on Si
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Development of Sputter Epitaxy Technique of Pure-Perovskite (001)/(100)-Oriented Sm-Doped Pb(Mgamp;subamp;1/3amp;/subamp;, Nbamp;subamp;2/3amp;/subamp;)Oamp;subamp;3amp;/subamp;–PbTiOamp;subamp;3amp;/subamp; on Si

机译:纯钙钛矿(001)/(100)取向Sm掺杂Pb(Mg1/3, Nb2/3)O3–PbTiO3在Si上

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We have developed a unique sputter deposition technique for a pure-perovskite (001)/(100)-oriented samarium-doped Pb(Mgamp;subamp;1/3amp;/subamp;, Nbamp;subamp;2/3amp;/subamp;)Oamp;subamp;3amp;/subamp;–PbTiOamp;subamp;3amp;/subamp; (Sm-PMN-PT) epitaxial thin film on Si as a future piezoelectric transducer thin film in microelectromechanical systems (MEMSs). This technique bases on the use of a “Pb(Zr,Ti)Oamp;subamp;3amp;/subamp; (PZT)-based seed layer” and “separate sputter deposition.” Undesired orientations and phases of such a relaxor-based ferroelectric are usually generated during the sputter deposition. This technique was demonstrated to provide preferential (001)/(100) orientation and pure-perovskite phase to the monocrystalline thin film. The fabricated film had excellent homogeneousness of the content distribution. Considering a practical thickness, a 2-amp;inline-formulaamp; amp;tex-math notation="LaTeX"amp;$mu text{m}$ amp;/tex-mathamp;amp;/inline-formulaamp;-thick monocrystalline thin film was grown on an Si substrate with this technique. Then, the piezoelectricity amp;inline-formulaamp; amp;tex-math notation="LaTeX"amp;$vert {e}_{{31},{f}}vert $ amp;/tex-mathamp;amp;/inline-formulaamp; of the Sm-PMN-PT/PZT stacked film was evaluated through an actuation test of the unimorph cantilever. As a result, it measured 16–17 C/mamp;supamp;2amp;/supamp;, which is almost comparable with intrinsic PZT polycrystalline thin films with high amp;inline-formulaamp; amp;tex-math notation="LaTeX"amp;$vert {e}_{{31},{f}}vert $ amp;/tex-mathamp;amp;/inline-formulaamp; values. Considering that the actuation voltage was divided into Sm-PMN-PT and PZT layers, the inherent piezoelectricity of the Sm-PMN-PT thin film is expected to be higher. Optimization of the phase in the film by tuning the composition ratio also will further improve the piezoelectricity. We believe that this achievement is a great step to discover a giant piezoelectricity relaxor-based thin film beyond PZT for MEMS.
机译:我们开发了一种独特的溅射沉积技术,用于纯钙钛矿(001)/(100)取向的钐掺杂Pb(Mgsub1/3/sub、Nbsub2/3/sub)Osub3/sub–PbTiOsub3/sub (Sm-PMN-PT)外延薄膜,作为微机电系统(MEMS)中未来的压电换能器薄膜。该技术基于使用“基于Pb(Zr,Ti)Osub3/sub(PZT)的种子层”和“单独的溅射沉积”。这种基于弛豫体的铁电体的不需要的取向和相位通常在溅射沉积过程中产生。该技术被证明可以为单晶薄膜提供优先的(001)/(100)取向和纯钙钛矿相。所制备的薄膜具有优异的含量分布均匀性。考虑到实际厚度,采用该技术在硅衬底上生长了2-inline-formula tex-math notation=“LaTeX”$mu text{m}$ /tex-math/inline-formula厚单晶薄膜。然后,通过单晶悬臂的致动试验,评估了Sm-PMN-PT/PZT叠层薄膜的压电inline-formula tex-math notation=“LaTeX”$vert {e}_{{31},{f}}vert $ /tex-math/inline-formula。结果,它测得的 16-17 C/msup2/sup,几乎可以与具有高 inline-formula tex-math notation=“LaTeX”$vert {e}_{{31},{f}}vert $ /tex-math/inline-formula 值的本征 PZT 多晶薄膜相媲美。考虑到驱动电压分为Sm-PMN-PT层和PZT层,Sm-PMN-PT薄膜固有的压电性预计更高。通过调整成分比例来优化薄膜中的相位也将进一步提高压电性。我们相信,这一成就是发现用于MEMS的超越PZT的巨型压电弛豫膜的一大步。

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