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Non-invasive and non-destructive characterization of MBE-grown CdZnTe/CdTe superlattice-based dislocation filtering layers

机译:基于MBE生长的CdZnTe/CdTe超晶格位错滤波层的无创、无损表征

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摘要

We report on the structural and optical properties of heteroepitaxial II-VI CdTe (211)B buffer layers with strained CdZnTe/CdTe superlattice layers, investigated by employing non-destructive methods including high-resolution x-ray diffraction, cathodoluminescence, and photoluminescence spectroscopy. X-ray diffraction reciprocal space mapping measurements revealed that the superlattice layers are coherently strained, leading to a spread in x-ray double-crystal rocking curve full-width at half-maximum values but better in-plane lattice-matching with HgCdTe. Both cross-sectional cathodoluminescence and photoluminescence measurements confirm the coherent growth of superlattice layers and their dislocation filtering effects. Both these techniques in CdTe layers are found to be well correlated with the dislocation density as determined by etch pit density measurements. The results indicate the potential of these non-destructive methods to be further developed into general-purpose techniques capable of characterizing the defect evolution in semiconductor heteroepitaxy. nbsp;Published under an exclusive license by AIP Publishing.
机译:我们报道了异质外延II-VI CdTe(211)B缓冲层的结构和光学性质,采用高分辨X射线衍射、阴极发光和光致发光光谱等非破坏性方法进行了研究。X射线衍射倒易空间映射测量表明,超晶格层具有相干应变,导致X射线双晶摇摆曲线在半峰值处全宽扩散,但与HgCdTe的面内晶格匹配更好。横截面阴极发光和光致发光测量都证实了超晶格层的相干生长及其位错滤波效应。在碲化镉层中,这两种技术都与蚀刻坑密度测量确定的位错密度密切相关。结果表明,这些非破坏性方法有可能进一步发展成为能够表征半导体异质外延缺陷演变的通用技术。在 AIP Publishing 的独家许可下发布。

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