A METHOD OF DETERMINING A CORRECTION FOR CONTROL OF A LITHOGRAPHY AND/OR METROLOGY PROCESS, AND ASSOCIATED DEVICES

摘要

In a first aspect of the invention, there is provided a method of determining a correction for control of at least one first component of a lithographic or metrology apparatus: the method comprising: obtaining a trained regression tree model which has been trained to map input data relating to at least one second component of the lithographic or metrology apparatus to a disturbance parameter related to a disturbance of said at least one first component, said disturbance having been caused by said at least one second component; obtaining input data relating to said at leasl one second component; and determining a compensatory correction for the disturbance parameter from said input data using the trained regression tree model.In a second aspect of the invention there is provided a computer program comprising program instructions operable to perform the method of the first aspect, when run on a suitable apparatus, and a non-transient computer program carrier and processing arrangement comprising such a computer program. In a third aspect of trie invention there is provided a lithographic tool for patterning a substrate or measuring a patterned structure on a substrate; the lithographic tool comprising: at least one first component; at least one second component; a processor; and a non-transient computer program carrier comprising a trained regression tree model, having been trained to map input data relating to the at least one second component to a disturbance parameter related to a disturbance of said at least one first component, said disturbance having caused by said at least one second component. In the context of the third embodiment "a lithographic tool" may comprise any tool used in a lithographic manufacturing process. This may include a lithographic exposure tool or scanner used to perform the exposures in the lithographic manufacturing process, or a metrology too (such as a seatierometer or scanning electron microscope) used in monitoring and/or control of such a lithographic manufacturing process.