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Avalanche photodiodes based on InAlAs/InGaAs heterostructures with sulfide-polyamide passivation of mesa structures

机译:基于InAlAs/InGaAs异质结构的雪崩光电二极管,具有硫化物-聚酰胺钝化台面结构

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Subject of study. A method for the sulfide-polyamide surface passivation of mesa structures of InAlAs/InGaAs avalanche photodiodes was considered and the static properties of the fabricated crystals of InAlAs/InGaAs avalanche photodiodes were investigated. Aim of study. The study aimed to investigate the effect of sulfide-polyamide surface passivation of mesa structures on the principal parameters of an avalanche photodiode. Method. Sulfide-polyamide surface passivation of a mesa structure entails processing the surface in an aqueous solution of ammonium sulfide followed by the application of a protective layer of AD-9103-30 polyamide. Main results. Avalanche photodiodes based on InAlAs/InGaAs heterostructures were fabricated and investigated. The surface of the mesa structure of avalanche photodiodes underwent sulfide-polyamide passivation. Crystals of avalanche photodiodes with an active area diameter of 32 mu m reproducibly ensured a dark current of 10-20 nA under an applied voltage of 0.9 of the breakdown voltage, uniform distribution of the breakdown voltage value across the sample area, and the long-term stability of parameters. Spectral sensitivity values of the devices in the 1550 nm region were 0.85-0.88 A/W, and their capacitance values were 0.11-0.12 pF. Ensuring the reproducibility and long-term stability of parameters is crucial to passivation technology. Parameter measurements of the avalanche photodiode crystals with sulfide-polyamide passivation performed with a 6-month interval confirmed the temporal stability of the dark current at the level of 5. Practical significance. The proposed method for the surface passivation of the mesa structure of InAlAs/InGaAs avalanche photodiodes entailing processing in an aqueous solution of ammonium sulfide followed by the application of a protective layer of AD-9103-30 polyamide can be used to fabricate avalanche photodiodes with a reproducible low level of dark current. (c) 2023 Optica Publishing Group
机译:研究主题。研究了InAlAs/InGaAs雪崩光电二极管台面结构的硫化-聚酰胺表面钝化方法,研究了InAlAs/InGaAs雪崩光电二极管晶体的静态性能。研究目的。该研究旨在研究台面结构硫化物-聚酰胺表面钝化对雪崩光电二极管主参数的影响。方法。台面结构的硫化物-聚酰胺表面钝化需要在硫化铵水溶液中处理表面,然后涂上 AD-9103-30 聚酰胺保护层。主要结果。制备并研究了基于InAlAs/InGaAs异质结构的雪崩光电二极管。雪崩光电二极管的台面结构表面进行了硫化物-聚酰胺钝化处理。有效面积直径为32 μ m的雪崩光电二极管晶体在击穿电压0.9的外加电压下可重复地保证了10-20 nA的暗电流,击穿电压值在整个样品区域均匀分布,参数长期稳定。器件在1550 nm区域的光谱灵敏度值为0.85-0.88 A/W,电容值为0.11-0.12 pF。确保参数的可重复性和长期稳定性对于钝化技术至关重要。以6个月的间隔对硫化物-聚酰胺钝化的雪崩光电二极管晶体进行参数测量,证实了暗电流在5%水平上的时间稳定性。现实意义。所提出的InAlAs/InGaAs雪崩光电二极管台面结构表面钝化的方法,需要在硫化铵水溶液中进行加工,然后涂覆AD-9103-30聚酰胺保护层,可用于制造具有可重现的低水平暗电流的雪崩光电二极管。(c) 2023 Optica 出版集团

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