The present disclosure relates to actuated stages, for example, a stage for supporting a reticle used in lithographic apparatuses and systems.A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus can, for example, project a pattern of a patterning device (e.g., a mask, a reticle) onto a layer of radiation-sensitive material (photoresist or simply "resist") provided on a substrate. To project a pattern on a substrate a lithographic apparatus can use electromagnetic radiation. The wavelength of this radiation determines the minimum size of features which can be formed on the substrate. A lithographic apparatus, which uses extreme ultraviolet (EUV) radiation, having a wavelength within the range 4-20 nm, for example 6,7 nm or 13.5 nm, can be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm. A lithographic system can output only a finite number of fabricated devices in a given timeframe. Fast scanning of wafer stages and reticle stages can improve the speed of fabrication. However, efforts to produce the high forces for high acceleration of movable stages can be hindered by tolerance issues with the machining of parts. An electromagnet actuator can attract a target with a greater force and less electrical power consumption when the electromagnet is placed closer to the target. However, a gap should be maintained between the electromagnet and the target (to prevent collision therebetween) and the closer their distance, the more accuracy is demanded in machining tolerances.
展开▼
