ELECTROMAGNETIC MOTOR, METHOD OF DETERMINING A POSITION DEPENDENT MOTOR CONSTANT FOR AN ELECTROMAGNETIC MOTOR, STAGE APPARATUS AND LITHOGRAPHIC APPARATUS

摘要

The present invention relates to an electromagnetic motor, in particular an electromagnetic motor as can be applied in a lithographic apparatus, e.g. to displace or position a patterning device or a substrate. A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may. for example, project a pattern (also often referred to as "design layout" or "design") of a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g.. a wafer).