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>The introduction of carbon nanosheet buffer layer for enhanced hydrogen evolution performance of C3N4/CoP photocatalysts
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The introduction of carbon nanosheet buffer layer for enhanced hydrogen evolution performance of C3N4/CoP photocatalysts
Various defects of nanocomposites inevitably bring some harmful effects on their photoelectric performance, especially considering that interface defects seriously hinder the carrier interfacial transfer. Here, the interface optimization can be realized between graphitic carbon nitride (C3N4) and CoP co-catalyst by the introduction of good conductive carbon nanosheets (CNs). As a result, the defect density of synthesized C3N4/CNs/CoP is reduced to 1.40 x 10(12) cm(-3) from 2.55 x 10(12) cm(-3) of C3N4/CoP, and its interface impedance is correspondingly reduced to 34 of that of C3N4/CoP. Therefore, the optimal H-2 evolution rate of 5.26 mmol g(-1) h(-1) and apparent quantum efficiency of 9.27 at 420 nm are realized, which are 4.8 and 8.1 times that of C3N4/CoP photocatalyst in the absence of CNs, respectively. This work provides a general solution to reduce defect density and carrier transfer resistance in nanocomposites by the introduction of a highly conductive buffer layer.
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机译:纳米复合材料的各种缺陷不可避免地会对其光电性能产生一些有害影响,特别是考虑到界面缺陷严重阻碍了载流子界面转移。通过引入导电良好的碳纳米片(CNs),可以实现石墨氮化碳(C3N4)与CoP助催化剂之间的界面优化。结果,合成的C3N4/CNs/CoP的缺陷密度从C3N4/CoP的2.55 x 10(12) cm(-3)降低到1.40 x 10(12) cm(-3),其界面阻抗相应降低到C3N4/CoP的34%。因此,在420 nm处实现了5.26 mmol g(-1) h(-1)的最佳析出H-2速率和9.27%的表观量子效率,在无CNs的情况下分别是C3N4/CoP光催化剂的4.8倍和8.1倍。这项工作提供了一种通用解决方案,通过引入高导电缓冲层来降低纳米复合材料中的缺陷密度和载流子转移电阻。
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