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Advanced Universal Hydrostatic Pressure Device with Pneumatic Amplifier for the Investigation of the Electrical and Thermal Properties of Semiconductors under Hydrostatic Pressure

机译:一种带气动放大器的先进通用型静水压力装置,用于研究半导体在静水压力下的电学和热性能

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摘要

A new design of a universal hydrostatic pressure device with a pneumatic amplifier for studying the electrophysical properties of semiconductors with deep impurity centers under hydrostatic pressure has been developed. The device makes it possible to perform a pulsed action of hydrostatic pressure on the test sample in two modes. This is a thermo mode in which the action of a pulsed pressure leads to an increase in the temperature of the sample and an isothermal mode in which the action of pressure is carried out without changing the temperature. It is shown, that the second mode provides the possibility to observe relaxation effects in semiconductors with deep levels at pulse pressure. The technical possibilities of the proposed device make it possible to carry out a study in both hydro-chamber modes in a range of pressures of 0-2 GPa and a temperature of 273-500 K. The maximum rate of pressure build-up in the thermal mode of the dP/dt = 2 x 10(8) Pa/s. In addition, in the isothermal mode of the hydrochamber, the pressure spreads almost instantaneously.
机译:开发了一种带有气动放大器的通用静水压力装置的新设计,用于研究具有深杂质中心的半导体在静水压力下的电物理特性。该装置可以在两种模式下对测试样品执行静水压力的脉冲作用。这是一种热模式,其中脉冲压力的作用导致样品温度升高,以及在不改变温度的情况下执行压力作用的等温模式。结果表明,第二种模式提供了在脉冲压力下观察具有深电平的半导体的弛豫效应的可能性。所提出的装置的技术可能性使得可以在0-2 GPa的压力和273-500 K的温度范围内以两种水室模式进行研究。dP/dt 热模式下的最大压力积聚速率 = 2 x 10(8) Pa/s。此外,在水室的等温模式下,压力几乎是瞬间扩散的。

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