Helical displacement Talbot lithography for duty cycles of periodic patterning

摘要

Abstract Talbot lithography has important applications in the manufacture of micro-nano periodic structures. However, simple Talbot lithography or longitudinal displacement Talbot lithography has relatively little effect on the duty cycle of the periodic structure. In this article, we propose the helical displacement Talbot lithography, which refers to the displacement based on the helix during the exposure process. Under the circumstance that the duty cycle of the mask remains unchanged, the lithography structure can achieve a duty cycle variation of 17.2–94.8. This conclusion provides theoretical basis and technical guidance for realizing the diversified manufacturing of duty cycle of micro-nano periodic functional structures such as diffraction gratings and photonic crystals.