E-SRIFS: A novel application of sub-resolution inner assist features to mitigate M3D effects on EUV imaging

摘要

A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICa). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability are under a fast-paced and extensive development. One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as KUV or EUVL), which allows for sub-10 nanometre (nm) scale resolution.