A lithographic apparatus is a machine that applies a desired pattern of structures onto a substrate, usually onto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of structures for integrated circuits (ICs). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability are under a fast-paced and extensive development. One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as EUV or EUVL), which allows for sub-10 nanometer (nm) scale resolution. During the measurement of structures on a wafer, a variety of processing parameters for the metrology apparatus may be required to properly measure the desired structures. The values of these processing parameters, or a set of data indicating particular settings of the metrology apparatus for performing the measurement task, is known as a "recipe". The recipe may vary for each kind of metrology apparatus, since each tool may slightly deviate from another tool e.g., due to process drift or environmental circumstances.
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