首页> 外文期刊>ECS Journal of Solid State Science and Technology >Phase Separation Induced Schottky Barrier Height Change in InAlAs/InP Heterostructure-based HEMT Devices
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Phase Separation Induced Schottky Barrier Height Change in InAlAs/InP Heterostructure-based HEMT Devices

机译:基于InAlAs/InP异质结构的HEMT器件中相分离诱导的肖特基势垒高度变化

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摘要

The effect of phase separation phenomenon in InAlAs layers grown by metal-organic chemical vapor deposition on the Schottky barrier height (SBH) is investigated. The phase separation into In-rich and Al-rich InxAlyAs columns of InAlAs (x = 0.52, y = 0.48) layers was observed when we grow them at a relatively low temperature below 600 degrees C. From the photoluminescence spectrum investigation, we found that the band-gap energy decreased from 1.48 eV for a homogeneous In0.52Al0.48As sample to 1.19 eV for a phase-separated InxAl1-xAs sample due to the band-gap lowering effect by In-rich InxAl1-xAs (x > 0.7) region. From the current density-voltage analysis of the InAlAs Schottky diode, it was also confirmed that the phase-separated InAlAs layers showed a lower SBH value of about 250 meV than it for the normal InAlAs layers. The reduction of SBH arising from the phase separation of InAlAs layers resulted in the larger leakage current in InAlAs Schottky diodes.
机译:研究了金属有机化学气相沉积生长的InAlAs层相分离现象对肖特基势垒高度(SBH)的影响。当我们在低于 600 摄氏度的相对较低的温度下生长时,观察到 InAlAs (x = 0.52, y = 0.48) 层的富 InxAlyAs 和富铝 InxAlyAs 柱的相分离。通过光致发光光谱研究,我们发现,由于In富集InxAl1-xAs(x > 0.7)区域的带隙降低作用,均匀In0.52Al0.48As样品的带隙能量从1.48 eV降低到相分离InxAl1-xAs样品的1.19 eV。通过对InAlAs肖特基二极管的电流密度-电压分析,还证实相分离的InAlAs层的SBH值比正常InAlAs层低约250 meV。InAlAs层相分离导致SBH的降低导致InAlAs肖特基二极管的漏电流较大。

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