Considering the above, it is an object of the invention tu provide an optical component with improved reflectivity for EUV radiation. According to an embodiment of the invention, there is provided an optical device for EUV radiation comprising: 1. an optical component for reflecting EUV radiation including a first electrode, 2. a second electrode arranged at a distance from the optical cumponent, and 3. a voltage source connected to the first electrode and the second electrode to apply a DC bias voltage between the first electrode and the second electrode such that the first electrode is negatively biased relalive to the second electrode, and wherein the voltage source is configured to apply the DC bias voltage between the first elecirode and the second electrode with a predetermined dynamic behavior. According to another embodiment of the invention, there is provided an illumination system configured to condition an EUV radiation beam comprising an optical device according to the invention. According to yet another embodiment of the invention, there is provided a projection system configured to project a patterned EUV radiation beam onto a substrate comprising an optical device according to the invention. According to a further embodiment of the invention, there is provided an EUV radiation source comprising an illumination system according to the invention. According to yet another embodiment of the invention, there is provided a lithographic apparatus comprising an illumination system and/or a projection system according to the invention. According to a further embodiment of the invention, there is provided a method for preventing deposition on an optical component and/or refurbishing of the optical component, said method comprising the step of dynamically applying a negative bias voltage to the optical component.
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