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Utility of Shockley–Read–Hall analysis to extract defect properties from semiconductor minority carrier lifetime data

机译:Shockley-Read-Hall 分析从半导体少数载流子寿命数据中提取缺陷特性的效用

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摘要

The semiconductor minority carrier lifetime contains information about several important material properties, including Shockley–Read–Hall defect levels/concentrations and radiative/Auger recombination rates, and the complex relationships between these parameters produce a non-trivial temperature-dependence of the measured lifetime. It is tempting to fit temperature-dependent lifetime data to extract the properties of the Shockley–Read–Hall recombination centers; however, without a priori knowledge of the distribution of the Shockley–Read–Hall states across the bandgap, this fit problem is under-constrained in most circumstances. Shockley–Read–Hall lifetime data are not well-suited for the extraction of Shockley–Read–Hall defect levels but can be used effectively to extract minority carrier recombination lifetimes. The minority carrier recombination lifetime is observed at temperatures below 100 K in a Si-doped n-type InGaAs/InAsSb superlattice, and deviation from its expected temperature-dependence indicates that the capture cross section of the defect associated with Si-doping has an activation energy of 1.5 meV or a characteristic temperature of 17 K. This lower temperature regime is also preferrable for the analysis of the physics of defect introduction with displacement-damage-generating particle irradiation.
机译:半导体少数载流子寿命包含有关几个重要材料特性的信息,包括肖克利-里德-霍尔缺陷水平/浓度和辐射/俄歇复合率,这些参数之间的复杂关系对测量的寿命产生了非平凡的温度依赖性。拟合与温度相关的寿命数据以提取肖克利-里德-霍尔复合中心的特性是很诱人的;然而,如果没有对Shockley-Read-Hall态在带隙中的分布的先验知识,这个拟合问题在大多数情况下是受约束不足的。Shockley-Read-Hall 寿命数据不太适合提取 Shockley-Read-Hall 缺陷水平,但可以有效地用于提取少数载流子复合寿命。在Si掺杂的n型InGaAs/InAsSb超晶格中,在低于100 K的温度下观察到少数载流子复合寿命,并且与其预期温度依赖性的偏差表明,与Si掺杂相关的缺陷的捕获截面具有1.5 meV的活化能或17 K的特征温度。这种较低的温度状态也更适合于分析具有位移损伤的粒子辐照的缺陷引入的物理特性。

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