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Room-temperature multiferroicity in GaFeO3 thin film grown on (100)Si substrate

机译:在(100)Si衬底上生长的GaFeO3薄膜的室温多铁性

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摘要

Room-temperature magnetoelectric multiferroicity has been observed in c-axis oriented GaFeO3 thin films (space group Pna2(1)), grown on economic and technologically important (100)Si substrates by a pulsed laser deposition technique. Structural analysis and comprehensive mapping of the Ga:Fe ratio across a length scale range of 10(4) reveals coexistence of epitaxial and chemical strain. It induces formation of finer magnetic domains and large magnetoelectric coupling-a decrease in remanent polarization by similar to 21 under similar to 50 kOe. Magnetic force microscopy reveals the presence of both finer (<100 nm) and coarser (similar to 2 mu m) magnetic domains. Strong multiferroicity in epitaxial GaFeO3 thin films, grown on a (100)Si substrate, brighten the prospect of their integration with Si-based electronics and could pave the way for development of economic and more efficient electromechanical, electrooptic, or magnetoelectric sensor devices. Published under an exclusive license by AIP Publishing.
机译:通过脉冲激光沉积技术在经济和技术上具有重要价值的(100)Si衬底上生长的c轴取向GaFeO3薄膜(空间群Pna2(1))中观察到室温磁电多铁性。在10(4)的长度尺度范围内对Ga:Fe比进行结构分析和综合映射,揭示了外延应变和化学应变的共存。它诱导形成更细的磁畴和大的磁电耦合 - 在相似的 50 kOe 下,剩余极化降低 21%。磁力显微镜显示存在更细(<100 nm)和更粗(类似于 2 μ m)磁畴。在(100)Si衬底上生长的外延GaFeO3薄膜具有很强的多铁性,这为它们与硅基电子器件的集成前景提供了光明,并可能为开发经济和更高效的机电、电光或磁电传感器器件铺平道路。在 AIP Publishing 的独家许可下发布。

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