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机译:In situ x-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al2O3 on SiO (x) /Si: Interface dipole and persistent surface groups
Peking Univ;
x-ray photoelectron spectroscopy; atomic layer deposition; surface chemistry; interface dipole; high-k; NICKEL AMIDINATE; TRIMETHYLALUMINUM; GROWTH; OXIDE; CHEMISORPTION; DIFFUSION; WATER;