首页> 外文期刊>ECS Journal of Solid State Science and Technology >A Stable Low Leakage Power SRAM with Built-In Read/Write-Assist Scheme using GNRFETs for IoT Applications
【24h】

A Stable Low Leakage Power SRAM with Built-In Read/Write-Assist Scheme using GNRFETs for IoT Applications

机译:稳定的低漏电功率SRAM,内置读/写辅助方案,采用GNRFET,适用于物联网应用

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Design of circuits using graphene nanoribbon field-effect transistors (GNRFETs), as promising next-generation devices, can improve total performance of a chip due to offering excellent properties. However, GNRFETs are in the early stage of design, and the studies of process-voltage-temperature (PVT) variations on their performance are very crucial. Therefore, this paper aims to design, simulate, and evaluate a novel stable fully differential 12 T (SFD12T) SRAM using GNRFETs under PVT variations. Simulation results in 16 nm GNRFET technology at 0.5 V show that the proposed design improves read stability/writability by 2.11x/1.09 x compared to fully differential 8 T (FD8T: as a basic cell) due to using built-in read/write-assist scheme, which forces "0" storing node to ground during a read operation and cuts pull-down path off during a write operation, respectively. An improvement of at least 4.79 (18.55 compared to FD8T) in leakage power is achieved due to stacking of transistors. The fourth-best read/write energy among eight studied SRAMs is related to the proposed design. In addition, it can support the bit-interleaving architecture because it eliminates half-select disturbance issues. Generally, the proposed design is the best SRAM from the figure of merit (FOM) point of view, so it can be an optimal choice for Internet-of-Things applications.
机译:使用石墨烯纳米带场效应晶体管(GNRFET)设计的电路作为有前途的下一代器件,由于具有出色的性能,可以提高芯片的整体性能。然而,GNRFET仍处于设计的早期阶段,研究其性能的过程-电压-温度(PVT)变化非常重要。因此,本文旨在设计、仿真和评估一种在PVT变化下使用GNRFET的新型稳定全差分12 T (SFD12T) SRAM。在0.5 V的16 nm GNRFET技术中的仿真结果表明,由于使用了内置的读/写辅助方案,该方案在读取操作期间强制“0”存储节点接地,并在写入操作期间切断下拉路径,因此所提出的设计与全差分8 T(FD8T:作为基本单元)相比提高了2.11倍/1.09倍的读取稳定性/可写性。 分别。由于晶体管的堆叠,泄漏功率至少提高了 4.79%(与 FD8T 相比提高了 18.55%)。在所研究的8个SRAM中,读/写能量排名第四,这与所提出的设计有关。此外,它还可以支持位交错架构,因为它消除了半选干扰问题。一般来说,从品质因数(FOM)的角度来看,所提出的设计是最佳的SRAM,因此它可以成为物联网应用的最佳选择。

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号