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An investigation of photo_electrical properties of silicon nanoparticles/PSi/p-Si hetero structures

机译:硅纳米颗粒/PSi/p-Si异质结构的photo_electrical性质研究

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摘要

In this work, two forms of nanocrystalline, were used (as-prepared macroPorous silicon and silicon nanoparticle) to synthesize hybrid structures for photodetectors applications. The fabrication pathway was carried out through two 2-steps processes. The 1-step was formation of as-prepared silicon nanoparticle (SiNPs), while and the 2-step was creation of low spam of macroPSi size substrate via electrochemical etching process in HF solutions. Specific features of SiNPs and low spam of macroPSi size substrate were explored using scanning electron microscopy SEM, energy-dispersive x-ray (EDX), Atomic Force Microscope (AFM), and photoluminescence (PL) spectroscopy respectively. Dark and photo current characteristics and spectral responsively of photodetectors were investigated for the macPSi layer and the hybrid structure. The performance of the hybrid configuration shows an improvement in the sensitivity of about 0.75 A/W with appearance of new additional peak at 450 nm as compared with the PSi photodetector of about 0.93 A/W. The achieved improvement is related with the appearance of double Heterojunction device between PSi/si and SiNPs/PSi. Also this improvement may be related with the reduction of the reflectd light from the hybrid structure due to the multiple reflection between SiNPs/PSi. The quantum efficiency eta of the photodetector in the spectral range 450-700 nm was found to be 65.
机译:在这项工作中,使用两种形式的纳米晶(制备的宏观多孔硅和硅纳米颗粒)来合成用于光电探测器应用的混合结构。制造途径通过两个两步工艺进行。第一步是形成制备的硅纳米颗粒(SiNPs),而第2步是在HF溶液中通过电化学刻蚀工艺产生低颗粒的macroPSi尺寸衬底。采用扫描电子显微镜扫描电镜(SEM)、能量色散X射线(EDX)、原子力显微镜(AFM)和光致发光(PL)光谱分别研究了SiNPs和macroPSi尺寸衬底的低垃圾邮件特性。研究了macPSi层和混合结构的光电探测器的暗电流和光电流特性以及光谱响应性。与PSi光电探测器约0.93 A/W相比,混合配置的性能提高了约0.75 A/W,并在450 nm处出现了新的附加峰。所取得的改进与PSi/si和SiNPs/PSi之间双异质结器件的出现有关。此外,这种改进可能与SiNPs/PSi之间的多重反射导致混合结构反射光的减少有关。光电探测器在450-700 nm光谱范围内的量子效率eta为65%。

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