首页> 外文期刊>International journal of environmental analytical chemistry >Application of Ni-doped ZnO deposited by RF magnetron sputtering technique on FTO as a photoanod in Photo-Electrocatalysis process of Ofloxacin degradation: synthesis, kinetics, and ecotoxicity study
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Application of Ni-doped ZnO deposited by RF magnetron sputtering technique on FTO as a photoanod in Photo-Electrocatalysis process of Ofloxacin degradation: synthesis, kinetics, and ecotoxicity study

机译:Application of Ni-doped ZnO deposited by RF magnetron sputtering technique on FTO as a photoanod in Photo-Electrocatalysis process of Ofloxacin degradation: synthesis, kinetics, and ecotoxicity study

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ABSTRACT In this work, a novel Ni-doped ZnO nano-electrocatalyst was synthesised via depositing on fluorine-doped tin oxide glass (FTO) and utilised for the successful degradation of Ofloxacin (OFL). Firstly, the Ni and ZnO foils were sputtered using Radio-Frequency Sputtering power 100 watts and time 60?min. Furthermore, the effect of operating variables (i.e., initial pH, electrical current, initial concentration of OFL, and reaction time), was investigated on the degradation of OFL by the Photo-electrocatalytic process through UV-A irradiation. Results demonstrated the suitable degradation of OFL, about 100% in optimal conditions. The reaction came after the first-order kinetics model, with an average R2 of 0.96. Based on the results, single processes (photolysis and electrolysis) and photocatalytic processes have much lower efficiency for OFL removal in comparison with the Photo-electrocatalytic process. This decrease in the toxicity unit is evident in different reaction times. Based on the GC-MS analysis, eight possible degradation pathways intermediate of OFL can be proposed. Also, the stability test of the electrode indicated that after nine continually runs, only 1.4% efficiency of the process decreased.

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