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机译:COMPOSITION, STRUCTURE, AND FUNCTIONAL PROPERTIES OF THIN SILICON NITRIDE FILMS GROWN BY ATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONS (REVIEW OF 25 YEARS OF RESEARCH)
Novosibirsk State Tech Univ;
microelectronics; silicon nitride; thin films; atomic layer deposition; composition; structure; functional properties; CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE FORMATION; GATE DIELECTRICS; HIGH-QUALITY; SINX FILMS; ALTERNATING EXPOSURES; PLASMA DEPOSITION; SURFACE-REACTION; OXIDE; PRECURSORS;