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首页> 外文期刊>Journal of optical technology >Producing holographic filters in the UV region 320-430 nm
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Producing holographic filters in the UV region 320-430 nm

机译:Producing holographic filters in the UV region 320-430 nm

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摘要

An experimental basis is provided for an optical layout for producing reflective-type UV holographic filters by means of a pulsed-periodic Xe-Cl excimer laser. To reduce the requirements on the coherence length of the laser to tenths of a millimeter, the single-beam layout proposed earlier by Yu. N. Denisyuk is used for producing the holograms, and a layout for obtaining holograms in spatially incoherent light is used to even out the illuminance created by the excimer laser in the region in which the filters are recorded. Filters for astronomical observations at wavelengths of 345, 375, and 405 nm are fabricated with reflectances from 87 to 91%. (c) 2005 Optical Society of America.

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