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首页> 外文期刊>IEEE journal of selected topics in quantum electronics: A publication of the IEEE Lasers and Electro-optics Society >Heterogeneously Integrated Membrane III-V Compound Semiconductor Devices With Silicon Photonics Platform
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Heterogeneously Integrated Membrane III-V Compound Semiconductor Devices With Silicon Photonics Platform

机译:具有硅光子学平台的异构集成膜III-V族化合物半导体器件

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Silicon photonics is a key technology for constructing large-scale photonic integrated circuits (PICs) because it enables large-scale wafer processes with high uniformity and quality. To further improve device characteristics, heterogeneous integration of III-V compound semiconductors that provide optical gain, a high modulation efficiency, and optical non-linearity is desired. This paper describes the heterogeneous integration of membrane III-V compound semiconductor photonic devices that have a similar structure including thickness and refractive index. These devices provide efficient optical coupling with a Si waveguide using a simple taper waveguide structure. If the total thickness of the film structure is designed to be less than the critical thickness (calculated to be 430 nm for fabrication conditions such as bonding and growth temperatures), high-quality epitaxial layers can be grown on a thin InP layer directly bonded to the Si substrate. Therefore, regrowth techniques are employed on bonded InP layer on SiO 2 /Si substrate. We fabricate two kinds of laser-integrated Mach-Zehnder modulators using epitaxial regrowth on Si substrates. One uses Si phase modulators, and the other uses InP-based modulators. A micro-transfer-printing technology is also important when the number of III-V devices is relatively small. Furthermore, the micro-transfer-printing technology enables devices to be selected that meet the required characteristics before integration. For this purpose, we try to integrate a membrane laser on a Si substrate, in which the membrane laser is fabricated on InP substrate. The device shows a threshold current of 0.8 mA when the active region length is 140 μm. Finally, we briefly describe a transmission module, in which directly modulated membrane lasers and electronic drivers are integrated by flip-chip bonding through Au bumps. To reduce power consumption, it is important to design driver circuits that incorporate semiconductor lasers as electronic components. We demonstrate a 2-channel 53-Gbit/s 4-level pulse amplitude modulation (PAM4) transmitter front-end consisting of a 2-channel PAM4 shunt laser driver and 2-channel O-band directly modulated membrane lasers. The total power consumption is only 60.7 mW, resulting in 0.57 mW/Gbit/s.
机译:硅光子学是构建大规模光子集成电路(PIC)的关键技术,因为它能够实现高均匀性和高质量的大规模晶圆工艺。为了进一步改善器件特性,需要提供光增益、高调制效率和光学非线性的III-V族化合物半导体的异构集成。本文描述了具有相似结构(包括厚度和折射率)的膜III-V族化合物半导体光子器件的异质集成。这些器件使用简单的锥形波导结构提供与硅波导的高效光耦合。如果薄膜结构的总厚度设计为小于临界厚度(在键合和生长温度等制造条件下计算为 430 nm),则可以在直接键合到 Si 衬底的薄 InP 层上生长高质量的外延层。因此,在SiO 2 /Si衬底上的键合InP层上采用了再生技术。我们利用硅衬底上的外延再生制造了两种激光集成的Mach-Zehnder调制器。一种使用硅相调制器,另一种使用基于InP的调制器。当III-V族器件数量相对较少时,微转印技术也很重要。此外,微转印技术可以在集成之前选择满足所需特性的设备。为此,我们尝试在Si衬底上集成膜激光器,其中膜激光器是在InP衬底上制造的。当有效区域长度为 140 μm 时,该器件的阈值电流为 0.8 mA。最后,我们简要介绍了一种传输模块,其中直接调制的薄膜激光器和电子驱动器通过金凸块的倒装芯片键合集成在一起。为了降低功耗,设计采用半导体激光器作为电子元件的驱动电路非常重要。我们演示了一款 2 通道 53 Gbit/s 4 电平脉冲幅度调制 (PAM4) 发射器前端,该前端由 2 通道 PAM4 分流激光驱动器和 2 通道 O 波段直接调制膜激光器组成。总功耗仅为 60.7 mW,为 0.57 mW/Gbit/s。

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