This research disclosure relates to an apparatus and method for precision locking in a lithographic apparatus. More particularly, this disclosure relates to precision locking (e.g. of a projection optics box interface ring) in a EUV lithographic apparatus. (Photo)lithography is a process of transferring a pattern to a radiation-sensitive substrate by exposing the substrate to radiation having the pattern. The pattern may be imparted onto a beam of radiation using a reticle (photomasks). Radiation used in a lithographic apparatus may be extreme ultraviolet (EUV). EUV lithography is used in printing integrated circuits.
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