Titanium aluminide thin films have been deposited on quartz plates by DC magnetron sputtering with a solenoid coil. A round shaped Ti and Al complex disk was employed as a target. In our sputtering system, because the spatial position of plasma on the target surface can be controlled by the solenoid coil current, the in-depth concentration profile of Ti and Al can be controlled by changing the solenoid coil current. Highly oriented Ti{sub}3Al, TiAl and TiAl{sub}3 films were synthesized from onecomplex Ti and Al target at 400℃ by changing the solenoid coil current. Gradient composite film of these titanium aluminides could also be fabricated by changing the solenoid coil current.
展开▼
