Research disclosure

摘要

The present disclosure relates to an improvement of reticle pods. More particularly, the present disclosure relates to the montage of the elements of reticle pods in order to reduce the particle contamination. The present development relates to a kinematic pod or mount with a dissipative function, The pod is suitable for a loading and unloading a reticle (mask) on a lithography apparatus. The lithography apparatus may be a deep ultraviolet (DUV) lithography apparatus or an extreme ultraviolet (EUV) lithography apparatus.