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Plasticity of indium antimonide between —176 °C and 400 °C under hydrostatic pressure. Part II: Microscopic aspects of the deformation

机译:锑化铟在-176°C至400°C静水压力下的塑性。第二部分:变形的微观方面

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摘要

Indium antimonide (InSb) has been plastically deformed over a wide temperature range, from 400 down to —176 °C (see the compan-ion paper: Kedjar B, Thilly L, Demenet JL, Rabier J. Acta Mater 2009) and transmission electron microscopy was used to characterize the deformation microstructures. In the ductile regime, i.e. T> T_(tr1) approx = 150 °C, the crystal deforms via the nucleation and motion of per-fect dislocations belonging to the glide set. In the brittle domain, i.e. for T< T_(tr1) approx = 150 °C, two regimes are observed: for T_(tr2) approx = 20 °C < T < T_(tr1) approx = 150 °C, the crystal deformation takes place via the nucleation and glide of dissociated perfect dislocations or only leading partials, while for T < T_(tr2) approx = 20 °C, the crystal deformation proceeds via the nucleation and motion of perfect disloca-tions belonging to the shuffle set. In view of these observations, the brittle-to-ductile transition (at T_(tr1)) is confirmed to correspond to a change in the dislocation nature in the glide set, from partial-mediated plasticity at low temperature to perfect-mediated plasticity at high temperature. Another transition is observed at T_(tr2) and corresponds to the glide-to-shuffle transition which is observed experimentally for the first time in a III-V compound semiconductor.
机译:锑化铟 (InSb) 在 400 至 -176 °C 的宽温度范围内发生塑性变形(参见组合论文:Kedjar B、Thilly L、Demenet JL、Rabier J. Acta Mater 2009),透射电子显微镜用于表征变形微观结构。在延展性状态下,即 T> T_(tr1) 约 = 150 °C,晶体通过属于滑动组的整齐位错的成核和运动而变形。在脆性域中,即对于 T< T_(tr1) 约 = 150 °C,观察到两种状态:对于 T_(tr2) 约 = 20 °C < T < T_(tr1) 约 = 150 °C,晶体变形通过解离的完美位错或仅前导部分的成核和滑动发生,而对于 T < T_(tr2) 约 = 20 °C,晶体变形通过属于洗牌集的完美位错的成核和运动进行。鉴于这些观察结果,脆性到延展性转变(在T_(tr1)处)被证实对应于滑移组中位错性质的变化,从低温下部分介导的塑性到高温下完美介导的塑性。在T_(tr2)处观察到另一个跃迁,对应于在III-V族化合物半导体中首次通过实验观察到的滑行到洗牌跃迁。

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