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首页> 外文期刊>Journal of optical technology >Study of the spectral sensitivity of silicon p-n junctions with a porous silicon film on the surface
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Study of the spectral sensitivity of silicon p-n junctions with a porous silicon film on the surface

机译:表面具有多孔硅膜的硅p-n结的光谱灵敏度研究

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This paper discusses the spectral response of silicon p-n junctions with a thin film of porous silicon on the surface. It is established that the spectral sensitivity becomes several times as great in the short-wavelength region of the visible spectrum. The observed effect is explained by the reduction in the number of active centers in the near-surface layer of single-crystal silicon that occurs during electrochemical anodization of single-crystal silicon.
机译:本文讨论了表面有多孔硅薄膜的硅p-n结的光谱响应。可以确定,在可见光谱的短波长区域,光谱灵敏度变得高几倍。观察到的效应可以通过单晶硅的电化学阳极氧化过程中发生的单晶硅近表面层中活性中心数量的减少来解释。

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