Threshold power density measurements for electronhyphen;beam sustained discharge excitation of XeF and KrF

摘要

Threshold power densities for electron‐beam‐stabilized discharge excitation of XeF and KrF lasers are reported for Ar+Kr+F2and Ar+Xe+NF3gas mixtures at 1 atm. Stable discharges were obtained with these gas mixtures for times greater than 0.5 &mgr;sec with lasing pulse width as long as 0.5 &mgr;sec. An analysis of data for several different pump power densities is presented which indicates that the threshold pump power density varies inversely with the cavity buildup time.