Synthesis and tribological behavior of silicon oxycarbonitride thin films derived from poly(urea)methyl vinyl silazane

摘要

A process for deposition of silicon oxycarbonitride films from poly(urea)methyl vinyl silazane (PUMVS) by spin coating precursor solutions onto a substrate, followed by polymerization, cross-linking and pyrolysis has been developed. The cross-linked polymer films (350 nm thick), deposited on variety substrates (e.g., silicon, sapphire, zirconia), were pyrolyzed in nitrogen or ammonia environments either in a hot isostatic press or in a tube furnace. Their microstructure was characterized using infrared and Raman spectroscopy. The tribological (friction and wear) behavior was evaluated in dry nitrogen and air with 50% relative humidity using a unidirectional linear wear tester in a ball-on-disk configuration. Wear surfaces, transfer films and wear debris were analyzed by scanning electron micrograph (SEM)/energy dispersive spectroscopy (EDS).