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首页> 外文期刊>Journal of optical technology >Fabrication and application of plane and concave varied line-space gratings for the vacuum spectral domain by interference lithography
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Fabrication and application of plane and concave varied line-space gratings for the vacuum spectral domain by interference lithography

机译:干涉光刻技术制备真空光谱域平面和凹面变化线间距光栅及其应用

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Subject of study. The feasibility of creating gratings with a spacing that varies on the grating surface according to a given law (that is, varied line-space gratings) with an average (approximately 600 mm-1) and high (up to 3000 mm-1) groove frequency by interference lithography at an argon laser wavelength of 488 nm is studied. Aim of study. The development of high-resolution flat-field varied line-space grating spectrographs for the vacuum ultraviolet and soft X-ray regions of the spectrum and their testing by recording line spectra of multiply charged ions in laser plasma is the goal of the study. Method. The developed method makes it possible to make diffraction varied line-space gratings for operation in spectrographs at the grazing incidence of radiation. In the first stage, the optical scheme with a spherical-mirror aberrator is designed, which provides the required frequency distribution of the interference fringes on the grating surface. After the "writing" of the grating on the photoresist and its development, the parameters of the resulting grating are measured by the diffraction of laser radiation (632.8 nm), the spectrograph is aligned, the line spectra are recorded in the soft X-ray region of the spectrum, and the characteristics of the instrument are evaluated. Main results. Varied line-space gratings with a gold reflective coating are fabricated: plane (with groove frequencies of 530 and 670 mm-1 at the edges of the grating) and spherical (curvature radius of 6 m and frequencies of 2100 and 2700 mm-1). The parameters of the varied line-space gratings are similar to the designed ones. The spectra of multiply charged ions were obtained in the range of 10-25 nm, and the spectral resolving power of 103, limited only by the pixel size (13 mu;m) of the CCD detector in use, was demonstrated. Practical significance. The capabilities of the domestic technology of interference lithography for the fabrication of varied line-space gratings and varied line-space grating spectrographs for the soft X-ray range of the spectrum are demonstrated. The spectrograph will be used to detect soft X-rays during the interaction of multiterawatt laser radiation with various targets. COPY; 2023 Optica Publishing Group
机译:研究主题。研究了在488 nm的氩激光波长下,通过干涉光刻技术在光栅表面上根据给定定律(即变化线距光栅)创建间距变化的光栅(即变化线距光栅)的可行性。研究目的。该研究的目标是开发用于光谱真空紫外和软X射线区域的高分辨率平场可变线空光栅光谱仪,并通过记录激光等离子体中多电荷离子的线谱对其进行测试。方法。所开发的方法使得在辐射掠入射下在光谱仪中操作衍射变化的线间光栅成为可能。在第一阶段,设计了带有球面镜像差器的光学方案,该方案为光栅表面上的干涉条纹提供了所需的频率分布。光栅在光刻胶上“写入”及其显影后,通过激光辐射(632.8nm)的衍射测量所得光栅的参数,对准光谱仪,在光谱的软X射线区域记录线光谱,并评估仪器的特性。主要结果。制造了带有金色反射涂层的各种线间距光栅:平面(光栅边缘的凹槽频率为 530 和 670 mm-1)和球形(曲率半径为 6 m,频率为 2100 和 2700 mm-1)。不同线间距光栅的参数与设计参数相似。在10-25nm范围内获得了多电荷离子的光谱,光谱分辨能力为103,仅受像素大小(13&μ;m)的CCD探测器的使用,进行了演示。现实意义。论证了国内干涉光刻技术在制备各种线间光栅和各种线间光栅光谱仪方面的能力。该光谱仪将用于检测多太瓦激光辐射与各种目标相互作用期间的软X射线。& 复制;2023 光学出版集团

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