首页> 外文期刊>journal of chemical physics >Molecular Structure and Internal Rotation of Hexachloroethane, Hexachlorodisilane, and Trichloromethylhyphen;Trichlorosilane
【24h】

Molecular Structure and Internal Rotation of Hexachloroethane, Hexachlorodisilane, and Trichloromethylhyphen;Trichlorosilane

机译:Molecular Structure and Internal Rotation of Hexachloroethane, Hexachlorodisilane, and Trichloromethylhyphen;Trichlorosilane

获取原文
           

摘要

The molecular structure and internal rotation of C2Cl6, SiCCl6, and Si2Cl6molecules were investigated by means of the sector‐microphotometer method of electron diffraction. An unmodified radial distribution function was proposed together with a reliability factor for the analysis of intensity curves obtained by the sector method.Two methods were used for estimating the height of potential barrier; one, which is applicable in case of high potential barrier, is to compute the height from the observed mean square amplitude of thegauchechlorine pair, the contribution of the skeleton vibrations being evaluated by a calculation based upon the force field compatible with the observed normal frequencies. The other method, which is available in case of low barrier, is to calculate the scattering intensity of a model having a certain potential barrier by taking a weighted average over‐all values of internal angle. For SiCCl6both approximate methods resulted in almost the same value for the barrier height. The heights of the potential barrier obtained were 10.8, 4.3, and 1 kcal/mole for C2Cl6, SiCCl6, and Si2Cl6, respectively.

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号