Metal patterning on organopolysilane-coated films by electroless deposition study of multi-layered metal pattern

摘要

Palladium colloid was formed by the reductivity of polysilane, when a palladium salt solution was contacted to the polysilane film. It was possible to make metallic nickel and copper on the polysilane film by electroless deposition using palladium colloid as a catalyst. Metal pattern of 1 μm level can be made by using the micro stamp method in addition to slectroless deposition. In this study, it was found that UV-irradiation to polysilane film was effective for adhesion between metal and baseboard, which is very important toward practical application of multilayered metal patterning.