机译:Influence of PH_3 Preflow Time on Initial Growth of GaP on Si Substrates by Metalorganic Vapor Phase Epitaxy
Department of Electrical and Electronic Engineering, Shizuoka University, Hamamatsu-shi, 432-8561 Japan;
defects; growth models; GaP on Si; metalorganic vapor phase epitaxy; semiconducting III-V compounds;