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首页> 外文期刊>Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films >Investigation of electric field effect on defects in GaAsN by admittance spectroscopy
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Investigation of electric field effect on defects in GaAsN by admittance spectroscopy

机译:电场效应对GaAsN缺陷的导纳光谱研究

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摘要

We use the Arrhenius transformation and matching (ATM) method to extract activation energy and attempt-to -escape frequency of the nitrogen-related defect (E1) in GaAsN from admittance spectroscopy measurements taken at various temperature and electric field. The ATM method is equivalent to the conventional Arrhenius plot and line-fitting (APL) method for Arrhenius processes with temperature-independent E-a and nu(0 )(e.g., E1 in a low electric field and at high temperatures) and advantageous for non-Arrhenius processes with temperature -dependent E-a and nu(0), (e.g., E1 in a high electric field and at low temperatures), where the APL method is not reliable. The ATM method enables a detailed account on how E(a )evolves with the temperature and the electric field in a continuously varying experimental space, which is not possible with the APL method. The evolution of carrier emission behaviors from the E1 defect and a neighboring E2 defect provides experimental evidence of field-induced metastability possibly due to the interaction of two defects with close atomic origins or spatial locations.
机译:我们使用阿伦尼乌斯变换和匹配(ATM)方法从不同温度和电场下的导纳光谱测量中提取GaAsN中氮相关缺陷(E1)的活化能和逃逸频率。ATM方法等效于传统的阿伦尼乌斯图和线拟合(APL)方法,适用于具有与温度无关的E-a和nu(0)的阿伦尼乌斯过程(例如,在低电场和高温下为E1),并且对于具有温度依赖性E-a和nu(0)的非阿伦尼乌斯过程(例如,E1在高电场和低温下), 其中 APL 方法不可靠。ATM方法可以详细描述E(a)如何在连续变化的实验空间中随温度和电场演变,这是APL方法无法实现的。E1缺陷和邻近的E2缺陷的载流子发射行为的演化为场诱导的亚稳态提供了实验证据,这可能是由于两个具有接近原子起源或空间位置的缺陷的相互作用。

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