Poly(di-hexyl silane) thin films are prepared by casting the solution onto (100) Si substrates, and the structure of the films obtained is examined by the X-ray diffraction method. As a result, it is found that the strength of the diffraction peaks from (010), (110), (020), and (220) planes is strong, whereas that of the diffraction peaks from (100) and (200) planes is weak. The reason is discussed on the bases of the molecular structure and packing of poly(di-hexyl silane).
展开▼
