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Before reliable near infrared spectroscopic analysis-the critical sampling proviso. Part 1. Generalised theory of sampling

机译:在可靠的近红外光谱分析之前 - 关键的采样条件。第 1 部分。广义抽样理论

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Non-representative sampling of materials, lots and processes intended for near infrared (NIR) analysis is often contributing hidden additions to the full Measurement Uncertainty (MUtotal = TSE + TAE(NIR)). The Total Sampling Error (TSE) can dominate over the Total Analytical Error (TAE(NIR)) by factors ranging from 5 to 10 to even 25 times, depending on material heterogeneity and the specific sampling procedures employed to produce the minuscule aliquot, which is the only material analysed. This review (Parts 1 and 2), extensively referenced with easily available complementing literature, presents a brief of all sampling uncertainty elements in the "lot-to-aliquot" pathway, which must be identified and correctly managed (eliminated or maximally reduced) in order to achieve, and to be able to document, fully minimised MUtotal. The more irregular and pervasive the heterogeneity, the higher the number of increments needed to reach 'fit-for-purpose representativity'. A particular focus is necessary regarding the sampling bias, which is fundamentally different from the well-known analytical bias. Whereas the latter can easily be subjected to bias correction, the sampling bias is non-correctable by any posteori means, notably not by chemometrics, nor statistics. Instead, all sampling operations must be designed to exclude the so-called Incorrect Sampling Errors (ISE), which are the hidden bias-generating agents. The key element in this endeavour is representative sampling and sub-sampling before analysis, as laid out by the Theory of Sampling (TOS), which is presented here in a novel compact fashion along with a complement of selected examples and demonstrations. TOS includes a safeguard facility, termed the Replication Experiment (RE), which enables estimation of the total sampling-plus-analysis uncertainty level (MUtotal) associated with NIR analysis (the RE is, for practical and logistical reasons, found in Part 2). Neglecting the TSE effects from the before-analysis domain is lack of due diligence. TOS to the fore!
机译:用于近红外 (NIR) 分析的材料、批次和工艺的非代表性采样通常会对完整的测量不确定度 (MUtotal = TSE + TAE(NIR)) 造成隐藏的补充。总采样误差 (TSE) 可能比总分析误差 (TAE(NIR)) 高出 5 到 10 倍甚至 25 倍,具体取决于材料异质性和用于生产微小等分试样的特定取样程序,这是唯一分析的材料。这篇综述(第 1 部分和第 2 部分)广泛引用了易于获得的补充文献,简要介绍了“批次到等分点”途径中的所有采样不确定性因素,必须识别和正确管理(消除或最大限度地减少)这些因素,以实现并能够记录完全最小化的 MUtotal。异质性越不规则和普遍,达到“适合目的的代表性”所需的增量数量就越多。需要特别关注抽样偏差,这与众所周知的分析偏差有根本的不同。虽然后者可以很容易地进行偏倚校正,但抽样偏倚是无法通过任何后验方法纠正的,特别是不能通过化学计量学或统计学来纠正。相反,所有采样操作都必须设计为排除所谓的错误采样误差 (ISE),这是隐藏的偏差产生因素。这项工作的关键要素是分析前的代表性抽样和次级抽样,正如抽样理论(TOS)所规定的那样,该理论在这里以一种新颖紧凑的方式介绍,并补充了一些选定的例子和演示。TOS包括一个称为复制实验(RE)的保障设施,它能够估计与NIR分析相关的总采样加分析不确定度水平(出于实际和后勤原因,RE见第2部分)。忽视前分析领域的TSE效应是缺乏尽职调查。TOS脱颖而出!

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