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Structural and optical properties and photoluminescence mechanism of fluorine-doped SnO_2 films during the annealing process

机译:氟掺杂SnO_2薄膜在退火过程中的结构光学性能及光致发光机理

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摘要

F-doped SnO_2 (SnO_x :F) films deposited on a glass substrate by atmospheric pressure chemical vapor deposition (APCVD) were annealed at 600 ℃ for different times. The effects of annealing time on the structural, optical and photoluminescence (PL) properties of SnO_x:F films were investigated. The results show that all the films have a polycrystalline cassiterite tetragonal crystal structure and exhibit obviously preferred orientations with (200) and (310) planes. The films annealed for 15 min possess the smallest particle sizes, of 94.95 nm, and a minimum root mean square roughness of 15.74 nm. The transmittances of all the films in the visible range can reach ~80. When the annealing time increases from 0 to 60 min, the optical band gap of SnO_x:F films decreases from 3.91 to 3.87 eV. The room temperature PL spectra show weak UV emission, intense violet emission and broad and weak blue emission. The violet emission related to F substitutions and oxygen vacancies is composed of three PL subbands centered at 3.22, 3.03 and 2.81 eV. The photoemission position is observed to be independent of annealing time.
机译:通过常压化学气相沉积(APCVD)沉积在玻璃基板上的F掺杂SnO_2(SnO_x:F)薄膜在600 °C下退火了不同时间。研究了退火时间对SnO_x:F薄膜结构、光学和光致发光(PL)性能的影响。结果表明,所有薄膜均具有多晶锡石四方晶体结构,在(200)和(310)平面上表现出明显的优选取向。退火15 min的薄膜具有最小的粒径,为94.95 nm,最小均方根粗糙度为15.74 nm。可见光范围内所有薄膜的透光率可达~80%。当退火时间从0 min增加到60 min时,SnO_x:F薄膜的光学带隙从3.91 eV减小到3.87 eV。室温PL光谱显示紫外发射弱、紫外发射强、蓝光发射宽而弱。与F取代和氧空位相关的紫色发射由三个PL子带组成,分别位于3.22、3.03和2.81 eV。观察到光发射位置与退火时间无关。

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