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首页> 外文期刊>Advanced Sustainable Systems >Hydrophobic Ni@N‐Doped TiO2 Nanosheet Arrays‐Carbon Paper Photocatalyst for CO2 Photoreduction at Tri‐Phase Interfaces
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Hydrophobic Ni@N‐Doped TiO2 Nanosheet Arrays‐Carbon Paper Photocatalyst for CO2 Photoreduction at Tri‐Phase Interfaces

机译:Hydrophobic Ni@N‐Doped TiO2 Nanosheet Arrays‐Carbon Paper Photocatalyst for CO2 Photoreduction at Tri‐Phase Interfaces

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摘要

Abstract Rational interphase reaction provides a feasible method to overcome the matters of insufficient adsorption of CO2 molecules at the catalytic sites and competitive hydrogen evolution reaction (HER), which can increase the formation rate and selectivity of carbon derivatives in photocatalytic CO2 reduction. Herein, a hydrophobic photocatalyst with TiO2 nanosheet arrays grown on hydrophobic carbon paper (TiO2‐HCP) is fabricated using a combination of magnetron sputtering and hydrothermal method, and its unique structure not only endows it excellent light absorption and effective carrier spatial separation but also avoids the hydrophobic reagent covering reactive sites. When the interphase reaction shifts from solid–liquid diphase to gas‐liquid‐solid tri‐phase, the photocatalytic CO2 reduction over TiO2‐HCP mainly generates CO molecules and effectively suppresses HER due to the HCP suppressing the mass transfer of H2O molecules to active sites. Notably, amounts of H2 byproduct can further react with CO2/CO to produce high value‐added CH4 resultant by modifying the N‐doped TiO2‐HCP with nickel/nickel oxide species. In the tri‐phase interfacial CO2 photoreduction system, the CH4 formation rate of Ni@N‐doped TiO2‐HCP reaches 134.17 µmol m−2 h−1 (about 74.6% selectivity) and total carbon derivatives selectivity is about 93%.
机译:提供了一个抽象理性的界面反应可行的方法来克服的问题吸附二氧化碳分子的不足氢催化网站和竞争力进化反应(她的),它可以增加碳的形成率和选择性衍生品在二氧化碳光催化还原。在此,一个疏水与二氧化钛光催化剂nanosheet阵列生长在疏水碳论文(二氧化钛必经HCP)是使用一个制作的磁控溅射和组合水热方法,其独特的结构只有赋予它优秀的光吸收和空间分离,也有效的载体避免了疏水活性试剂网站。固液双相的气体还是液体还是固体三必经阶段,光催化二氧化碳削减二氧化钛HCP应承担的主要生成CO分子有效地抑制由于HCP抑制水分子的传质活跃的网站。可以进一步与二氧化碳反应/公司生产高吗值检测甲烷合成通过修改补充道N掺杂二氧化钛HCP应承担与镍/镍氧化物物种。光还原系统,CH4形成的Ni@N高掺杂二氧化钛自量HCP达到134.17µ摩尔m h 2−−1(大约74.6%选择性)和总碳衍生品选择性约为93%。

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