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Tunneling transport of 2D anisotropic XC (X = P, As, Sb, Bi) with a direct band gap and high mobility: a DFT coupled with NEGF study

机译:具有直接带隙和高迁移率的二维各向异性XC(X = P,As,Sb,Bi)的隧穿输运:DFT与NEGF研究的耦合

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摘要

Direct bandgap and significant anisotropic properties are crucial and beneficial for nanoelectronic applications. In this work, through first-principles calculations, we investigate novel two-dimensional (2D) α-XC (X = P, As, Sb, Bi) materials, which possess a direct bandgap of 0.73 to 1.40 eV with remarkable anisotropic electronic properties. Intriguingly, 2D α-XC presents the highest electron mobility near 8 × 103 cm2 V−1 s−1 along the Γ–X direction. Moreover, the transfer characteristics of the 2D α-XC TFETs are thoroughly assessed through NEGF methods. AsC TFETs demonstrate an on-state current larger than 2.2 × 103 μA μm−1, which can satisfy the International Technology Roadmap for Semiconductors (ITRS) for high-performance requirements. In particular, the minimum value of subthreshold swing of devices is as low as 15 mV dec−1, indicating excellent device switching characteristics. The relevant calculation results show that 2D α-XC monolayers could be a promising candidate in next-generation high-performance device applications.
机译:直接带隙和显著的各向异性属性是至关重要和有益的纳米电子应用程序。通过采用基于计算,我们研究新颖的二维(2 d)αxc (X =P为某人,Bi)材料,具有直接能带与非凡的0.73到1.40 eV各向异性的电子性质。2 dαxc礼物电子迁移率最高附近的8×103 cm2沿着ΓV−1 s−1 - x方向。此外,2 d的传输特性αxc TFETs通过NEGF彻底评估方法。电流大于2.2×103μμm−1,可以满足国际技术路线图为高性能半导体(也是)要求。阈下的设备低至15 mV12月−1,表明优秀的设备开关特征。显示2 dαxc层可能是有前途的候选人在下一代高性能设备应用程序。

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