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首页> 外文期刊>Nanoscale >Anomalous isoelectronic chalcogen rejection in 2D anisotropic vdW TiS3(1-x)Se3x trichalcogenides
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Anomalous isoelectronic chalcogen rejection in 2D anisotropic vdW TiS3(1-x)Se3x trichalcogenides

机译:异常等电子的硫族元素排斥在2 d就是secu * tanu减去vdW各向异性TiS3 (1 - x) Se3x trichalcogenides

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Alloying in semiconductors has enabled many civilian technologies in electronics, optoelectronics, photonics, and others. While the alloying phenomenon is well established in traditional bulk semiconductors owing to a vast array of available ternary phase diagrams, alloying in 2D materials still remains at its seminal stages. This is especially true for transition metal trichalcogenides (TMTCs) such as TiS3 which has been recently predicted to be a direct gap, high carrier mobility, pseudo-1D semiconductor. In this work, we report on an unusual alloying rejection behavior in TiS3(1-x)Se3x vdW crystals. TEM, SEM, EDS, and angle-resolved Raman measurements show that only a miniscule amount (8%) of selenium can be successfully alloyed into a TiS3 host matrix despite vastly different precursor amounts as well as growth temperatures. This unusual behavior contrasts with other vdW systems such as TiS2(1-x)Se2x, MoS2(1-x)Se2x, Mo1-xWxS2, WS2(1-x)Se2x, where continuous alloying can be attained. Angle-resolved Raman and kelvin probe force microscopy measurements offer insights into how selenium alloying influences in-plane structural anisotropy as well as electron affinity values of exfoliated sheets. Our cluster expansion theory calculations show that only the alloys with a small amount of Se can be attained due to energetic instability above/below a certain selenium concentration threshold in the ternary phase diagrams. The overall findings highlight potential challenges in achieving stable Ti based TMTCs alloys.
机译:合金在半导体使得许多民用技术在电子技术中,光电子学、光子学和其他人。合金现象已很好地融入传统的大部分半导体由于巨大的一系列可用的三元相图,合金在二维材料仍在重要阶段。过渡金属trichalcogenides (TMTCs)等TiS3最近预测是一个直接的差距,高载流子迁移率,pseudo-1D半导体。不寻常的合金拒绝行为就是secu * tanu减去vdW TiS3 (1 - x) Se3x晶体。angle-resolved拉曼测量显示很少的量(8%)的硒成功合金TiS3主机矩阵尽管截然不同的前体含量生长温度。就是secu * tanu减去vdW行为与其他系统等TiS2 (1-x) Se2x;辉钼矿(1-x) Se2x, Mo1-xWxS2;二硫化钨(1 - x) Se2x,连续合金化达到的。力显微镜测量提供见解硒合金平面影响如何结构各向异性以及电子关联表的值剥落了。理论计算表明,只有扩张合金与少量的Se可以达到由于能量不稳定高于/低于a某些硒浓度阈值的三元相图。强调在实现潜在的挑战稳定的基于Ti TMTCs合金。

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