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Epitaxial graphene/silicon carbide intercalation: a minireview on graphene modulation and unique 2D materials

机译:外延石墨烯/碳化硅夹层:摘要概述了石墨烯调制和独特的2 d材料

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摘要

Intercalation of atomic species through epitaxial graphene on silicon carbide began only a few years following its initial report in 2004. The impact of intercalation on the electronic properties of the graphene is well known; however, the intercalant itself can also exhibit intriguing properties not found in nature. This realization has inspired new interest in epitaxial graphene/silicon carbide (EG/SiC) intercalation, where the scope of the technique extends beyond modulation of graphene properties to the creation of new 2D forms of 3D materials. The mission of this minireview is to provide a concise introduction to EG/SiC intercalation and to demonstrate a simplified approach to EG/SiC intercalation. We summarize the primary techniques used to achieve and characterize EG/SiC intercalation, and show that thermal evaporation-based methods can effectively substitute for more complex synthesis techniques, enabling large-scale intercalation of non-refractory metals and compounds including two-dimensional silver (2D-Ag) and gallium nitride (2D-GaNx).
机译:原子物种通过外延的夹层石墨烯在碳化硅开始只有几个在2004年之后首次报告。夹层对电子的影响石墨烯的属性是众所周知的;然而,intercalant本身也可以展示自然界中尚未发现的有趣的属性。实现激发了新的兴趣外延石墨烯/碳化硅(例如/ SiC)夹层,技术的范围超出调制石墨烯的属性创建新的二维形式的三维材料。的使命是提供一个小回顾简洁的介绍/ SiC夹层和展示一个简化的方法如/ SiC夹层。技术用于实现和描述例如/ SiC夹层,表明热evaporation-based方法可以有效地代替更复杂的合成技术,使大规模夹层non-refractory包括金属和化合物二维(2 d-ag)和镓银氮化(2 d-ganx)。

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