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Halide-assisted metal ion reduction: emergent effects of dilute chloride, bromide, and iodide in nanoparticle synthesis

机译:Halide-assisted金属离子还原:紧急稀释的影响氯、溴和碘在纳米粒子的合成

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Understanding the competing effects of growth-directing additives, such as halide ions, on particle formation in solution phase metal nanoparticle syntheses is an ongoing challenge. Further, trace halide impurities are known to have a drastic impact on particle morphology as well as reproducibility. Herein, we employ a "halide-free" platform as an analogue to commonly used halide-containing surfactants and metal precursors to isolate and study the effects of micromolar concentrations of halide ions (chloride, bromide, and iodide) on the rate of metal ion reduction. In the absence of competing halides from precursors and surfactants, we observe a catalytic effect of low concentrations of halide ions on the rate of metal ion reduction, an influence which is fundamentally different from the previously reported role of halides in metal nanoparticle growth. We propose that this halide-assisted metal ion reduction proceeds via the formation of a halide bridge which facilitates the adsorption of the metal precursor to a growing nanoparticle and, subsequently, electron transfer from the particle surface. We then demonstrate that this process is operative not only in the well-controlled "halide-free" platform, but also in syntheses involving high concentrations of halide-containing surfactants as well as metal precursors with halide ligands. Importantly, this study shows that halide-assisted metal ion reduction can be extended to bimetallic systems and provides a handle for the directed differential control of metal ion reduction in one-pot co-reduction syntheses.
机译:理解的竞争效应growth-directing添加剂,如卤离子,在金属粒子在溶液中形成阶段纳米颗粒合成是一个持续的挑战。此外,跟踪卤化物已知杂质产生剧烈影响粒子形态是吗再现性。“halide-free”作为一般的模拟平台使用halide-containing表面活性剂和金属前体孤立和学习的影响微摩尔的卤离子的浓度(氯、溴、碘)的速度金属离子的减少。卤化物的前兆和表面活性剂,我们观察低浓度的催化效果卤离子的金属离子的速率从根本上减少的影响不同于之前报道的作用卤化物在金属纳米颗粒的增长。这halide-assisted金属离子还原收益通过卤化桥的形成促进金属的吸附纳米颗粒越来越大的前兆,随后,粒子的电子转移表面。手术不仅在控制“halide-free”平台,而且在合成包括高浓度的halide-containing表面活性剂以及金属前体与卤化物配体。研究表明,halide-assisted金属离子减少可以扩展到双金属体系并提供一个指示处理微分控制金属离子减少锅co-reduction合成。

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