...
首页> 外文期刊>Nanoscale >Coulomb barrier creation by means of electronic field emission in nanolayer capacitors
【24h】

Coulomb barrier creation by means of electronic field emission in nanolayer capacitors

机译:通过电子库仑势垒的创建场致发射nanolayer电容器

获取原文
获取原文并翻译 | 示例

摘要

The main mechanism of energy loss in capacitors with nanoscale dielectric films is leakage currents. Using the example of Al-Al2O3-Al, we show that there are two main contributions, namely the cold field emission effect and the hopping conductivity through the dielectric. Our main finding is that an application of a high electric field, similar to 0.6-0.7 GV m(-1), causes electrons to penetrate the dielectric. If the temperature is sufficiently low, such electrons become permanently trapped in the dielectric. To achieve a strong charging of the dielectric, the voltage needs to be high enough, so that a field emission occurs from the cathode into the dielectric. Such a strongly charged dielectric layer generates a Coulomb barrier and leads to a suppression of the leakage current. Thus, after the dielectric nanolayer of the capacitor is charged, the field emission and the hopping conductivity are both suppressed, and the hysteresis of theI-Vcurve disappears. The phenomenon is observed at temperatures up to similar to 225 K. It would be advantageous to identify insulators in which the phenomenon of the Coulomb barriers persists even up to the room temperature, but at this time it is not known whether such dielectrics exist and/or can be designed.
机译:在电容器能量损失的主要机制与纳米介电薄膜泄漏电流。显示有两个主要的贡献,场致发射效应,即冷通过介电跳跃电导率。一个高的主要发现是,一个应用程序电场,类似于0.6 - -0.7问m (1),导致电子穿透介质。温度足够低,等电子成为永久困在介质。介质,需要足够高的电压,所以,从阴极场致发射发生介质。介电层产生了库仑势垒导致泄漏电流的抑制。因此,介质nanolayer后电容器充电,场致发射和跳跃电导率都是压制,滞后的theI-Vcurve消失了。现象是观察到的温度类似于225 K。确定绝缘体的现象库仑障碍甚至持续到房间温度,但尚不清楚是否存在这样的电介质和/或设计。

著录项

相似文献

  • 外文文献
  • 中文文献
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号