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Growth and spectroscopic characterization of monolayer and few-layer hexagonal boron nitride on metal substrates

机译:增长和光谱表征单层和few-layer六角氮化硼在金属基板

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Atomically thin two dimensional hexagonal boron nitride (2D h-BN) is one of the key materials in the development of new van der Waals heterostructures due to its outstanding properties including an atomically smooth surface, high thermal conductivity, high mechanical strength, chemical inertness and high electrical resistance. The development of 2D h-BN growth is still in the early stages and largely depends on rapid and accurate characterization of the grown monolayer or few layers h-BN films. This paper demonstrates a new approach to characterizing monolayer h-BN films directly on metal substrates by grazing-incidence infrared reflection absorption spectroscopy (IRRAS). Using h-BN films grown by atmospheric-pressure chemical vapor deposition on Cu and Ni substrates, two new sub-bands are found for the A(2u) out-of-plane stretching mode. It is shown, using both experimental and computational methods, that the lower-energy sub-band is related to 2D h-BN coupled with substrate, while the higher energy sub-band is related to decoupled (or free-standing) 2D h-BN. It is further shown that this newly-observed fine structure in the A(2u) mode can be used to assess, quickly and easily, the homogeneity of the h-BN-metal interface and the effects of metal surface contamination on adhesion of the layer.
机译:自动薄的二维六角形硼氮化(2 d h-BN)的关键材料之一开发新的范德瓦耳斯异质结构由于其突出属性包括一个原子级光滑表面上看,高导热系数、高机械强度,化学惰性和高电阻。增长仍处于早期阶段,很大程度上取决于快速而准确的描述单层生长或几层h-BN电影。本文展示了一种新方法直接描述单层h-BN电影通过掠入射红外金属基板反射吸收光谱(IRRAS)。h-BN电影增加了大气压化学气相沉积铜和镍基板,两个新的分解后发现的出平面(2 u)拉伸模式。实验和计算方法,较长的副环带与2 d h-BN有关再加上衬底,而更高的能量可解耦(或有关自立式)2 d h-BN。这个新近观察到精细结构(2 u)可以用来评估模式,快速和容易,h-BN-metal界面和同质性金属表面污染的影响层的附着力。

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