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Metal-insulator crossover in multilayered MoS2

机译:在多层二硫化钼金属绝缘体交叉

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The temperature dependence of electrical transport properties was investigated for multilayered MoS2 field effect transistor devices with thicknesses of 3-22 nm. Some devices showed typical n-type semiconducting behavior, while others exhibited metal-insulator crossover (MIC) from metallic to insulating conduction at finite temperatures. The latter effect occurred near zero gate voltage or at high positive gate voltages. Analysis of Raman spectroscopy revealed the key difference that devices with MIC have a metallic 1T phase as well as a semiconducting 2H phase, whereas devices without the MIC did not have a metallic 1T phase. These results suggest that the metallic 1T phase may contribute to inducing the MIC.
机译:电子传输的温度依赖性多层二硫化钼的性质进行了研究场效应晶体管器件厚度3-22海里。当别人表现出半导体行为从金属到金属绝缘体交叉(MIC)在有限温度下绝缘导电。后者影响发生接近于零电压或门在高积极的栅电压。光谱显示关键的区别设备与麦克风金属1 t阶段作为半导体2 h阶段,而设备没有麦克风没有金属1 t的阶段。这些结果表明,金属1 t的阶段可能导致诱导麦克风。

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